One-step production of anisotropically etched graphene using supercritical water

Takaaki Tomai, Naoki Tamura, Itaru Honma

    Research output: Contribution to journalArticlepeer-review

    7 Citations (Scopus)

    Abstract

    We developed a one-step method for production of anisotropically etched graphene using supercritical fluid (SCF). Anisotropic etching of a graphite substrate and dispersed graphite powder with Ag nanoparticles was conducted in supercritical water (SCW). Because of the exfoliation effect of SCF, graphene was isolated from the graphite simultaneously with the anisotropic etching. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy revealed the production of multilayer graphene exfoliated from the anisotropically etched graphite surface.

    Original languageEnglish
    Pages (from-to)794-798
    Number of pages5
    JournalACS Macro Letters
    Volume2
    Issue number9
    DOIs
    Publication statusPublished - 2013 Sep 17

    ASJC Scopus subject areas

    • Organic Chemistry
    • Polymers and Plastics
    • Inorganic Chemistry
    • Materials Chemistry

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