One-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure

T. Ohzono, T. Nishikawa, Masatsugu Shimomura

    Research output: Contribution to journalArticlepeer-review

    22 Citations (Scopus)

    Abstract

    The one-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure was described. The patterned films were fabricated on poly(dimethyl siloxane)[PDMS], an elastomer substrates with bas-relief patterns. The amphiphilic copolymer used for the fabrication of patterned films films was synthesized. The PDMS was cured on the master pattern at 60°C for 4h.

    Original languageEnglish
    Pages (from-to)2243-2247
    Number of pages5
    JournalJournal of Materials Science
    Volume39
    Issue number6
    DOIs
    Publication statusPublished - 2004 Mar 15

    ASJC Scopus subject areas

    • Materials Science(all)
    • Mechanics of Materials
    • Mechanical Engineering

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