On-wafer UV sensor and prediction of UV irradiation damage

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

UV radiation during plasma processing affects the surface of materials. Nevertheless, the interaction of UV photons with surface is not clearly understood because of the difficulty in monitoring photons during plasma processing. For this purpose, we have previously proposed an on-wafer monitoring technique for UV photons. For this study, using the combination of this on-wafer monitoring technique and a neural network, we established a relationship between the data obtained from the on-wafer monitoring technique and UV spectra. Also, we obtained absolute intensities of UV radiation by calibrating arbitrary units of UV intensity with a 126 nm excimer lamp. As a result, UV spectra and their absolute intensities could be predicted with the on-wafer monitoring. Furthermore, we developed a prediction system with the on-wafer monitoring technique to simulate UV-radiation damage in dielectric films during plasma etching. UV-induced damage in SiOC films was predicted in this study. Our prediction results of damage in SiOC films shows that UV spectra and their absolute intensities are the key cause of damage in SiOC films. In addition, UV-radiation damage in SiOC films strongly depends on the geometry of the etching structure. The on-wafer monitoring technique should be useful in understanding the interaction of UV radiation with surface and in optimizing plasma processing by controlling UV radiation.

Original languageEnglish
Title of host publicationSpringerBriefs in Applied Sciences and Technology
PublisherSpringer Verlag
Pages5-18
Number of pages14
DOIs
Publication statusPublished - 2014 Jan 1

Publication series

NameSpringerBriefs in Applied Sciences and Technology
Volume102
ISSN (Print)2191-530X
ISSN (Electronic)2191-5318

Keywords

  • Absolute UV intensity
  • Electron–hole pair
  • Low-k dielectric film
  • Neural network
  • On-wafer UV sensor
  • UV spectrum

ASJC Scopus subject areas

  • Biotechnology
  • Chemical Engineering(all)
  • Mathematics(all)
  • Materials Science(all)
  • Energy Engineering and Power Technology
  • Engineering(all)

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  • Cite this

    Samukawa, S. (2014). On-wafer UV sensor and prediction of UV irradiation damage. In SpringerBriefs in Applied Sciences and Technology (pp. 5-18). (SpringerBriefs in Applied Sciences and Technology; Vol. 102). Springer Verlag. https://doi.org/10.1007/978-4-431-54795-2_2