On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during Si O2 etching process

Butsurin Jinnai, Toshiyuki Orita, Mamoru Konishi, Jun Hashimoto, Yoshinari Ichihashi, Akito Nishitani, Shingo Kadomura, Hiroto Ohtake, Seiji Samukawa

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8 Citations (Scopus)

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Physics & Astronomy

Engineering & Materials Science