Abstract
The Vth controllability of the 4-terminal double-gate MOSFETs (4T-DGFET) was investigated using comprehensible device modeling. The fabrication of two types of 4T-DGFETs such as, Fin-type 4T-DGFT (4T-FinFET) and vertical-type 4T-DGFET (4T-VFET), were also discussed. The 4T-VFET was fabricated by modifying the layout of the gate contact pad for 3T-VFET. The results show that setting the workfunction of VthDG (i.e, of V th in the DG mode) at a low value is preferable for improvement of the performance of 4T-DGFETs.
Original language | English |
---|---|
Pages (from-to) | 100-101 |
Number of pages | 2 |
Journal | Proceedings - IEEE International SOI Conference |
Publication status | Published - 2004 Dec 1 |
Externally published | Yes |
Event | 2004 IEEE International SOI Conference, Proceedings - Charleston, SC, United States Duration: 2004 Oct 4 → 2004 Oct 7 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering