Observation of reflected X-rays from end face of organic thin film

Kouichi Hayashi, Tokujiro Yamamoto, Takahiro Nakamura, Kensuke Kitani, Kosuke Suzuki, Masahisa Ito, Hiromichi Adachi

Research output: Contribution to journalArticle

Abstract

During the irradiation of white X-rays of synchrotron radiation on copper phthalocyanine thin film on a Si wafer (CuPc/Si) under the grazing incidence condition, X-rays from the end face of the CuPc layer were observed by solid state detector. These were understood to be refractions through the CuPc layer and reflections from the CuPc/Si, because their energy variation as a function of the X-ray exit angle followed Snell's law. We also discussed the similarities and differences between the observed phenomenon and X-ray waveguide phenomenon.

Original languageEnglish
Article number012029
JournalJournal of Physics: Conference Series
Volume83
Issue number1
DOIs
Publication statusPublished - 2007 Jun 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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