TY - JOUR
T1 - Observation of local dipole moment of Si atoms on Si(100) surfaces using noncontact scanning nonlinear dielectric microscopy
AU - Kin, Nobuhiro
AU - Osa, Yuhei
AU - Cho, Yasuo
PY - 2009
Y1 - 2009
N2 - To confirm the performance of noncontact scanning nonlinear dielectric microscopy (NC-SNDM), we attempted to determine the local dipole moment of Si atoms on a cleaned Si (100) surface under UHV conditions. From the topography images, atomically flat terraces, step structures, and defects were clearly recognized, and paired bright spots with a 2×1 symmetry were observed with clear contrast. In addition, we observed the local electric dipole moment distribution of Si atoms on a 2×1 structure. This revealed that the surface is naturally biased with an offset potential of -0.2 V, and the direction of the local dipole moment is upward at dimer sites for bias values above -0.2 V.
AB - To confirm the performance of noncontact scanning nonlinear dielectric microscopy (NC-SNDM), we attempted to determine the local dipole moment of Si atoms on a cleaned Si (100) surface under UHV conditions. From the topography images, atomically flat terraces, step structures, and defects were clearly recognized, and paired bright spots with a 2×1 symmetry were observed with clear contrast. In addition, we observed the local electric dipole moment distribution of Si atoms on a 2×1 structure. This revealed that the surface is naturally biased with an offset potential of -0.2 V, and the direction of the local dipole moment is upward at dimer sites for bias values above -0.2 V.
UR - http://www.scopus.com/inward/record.url?scp=67650730196&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=67650730196&partnerID=8YFLogxK
U2 - 10.1063/1.3158049
DO - 10.1063/1.3158049
M3 - Article
AN - SCOPUS:67650730196
VL - 106
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 1
M1 - 014302
ER -