Observation of gate-controlled superconducting proximity effect in microfabricated thin graphite films

T. Sato, A. Kanda, S. Tanaka, H. Goto, Y. Ootuka, H. Miyazaki, S. Odaka, K. Tsukagoshi, Y. Aoyagi

Research output: Contribution to journalArticlepeer-review

Abstract

We investigated the influence of the oxygen plasma etching on the electron transport in thin graphite films. The semimetallic temperature dependence of zero-bias resistance was observed for samples microfabricated with both Al mask and resist mask, but the possible damage by e-beam irradiation was observed in films with Al mask. In thin graphite films microfabricated by O2 plasma with resist mask, the proximity-induced superconductivity was observed and the critical supercurrent and temperature strongly depend on the gate voltage.

Original languageEnglish
Article number012031
JournalJournal of Physics: Conference Series
Volume109
Issue number1
DOIs
Publication statusPublished - 2008 Mar 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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