Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

H. Nishiyama; M. Shigeta

doi:10.1051/epjap:2002034

Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

H. Nishiyama, M. Shigeta

Creative Flow Research Division

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.

Original language	English
Pages (from-to)	125-133
Number of pages	9
Journal	EPJ Applied Physics
Volume	18
Issue number	2
DOIs	https://doi.org/10.1051/epjap:2002034
Publication status	Published - 2002 May

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics

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Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

Abstract

ASJC Scopus subject areas

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