Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

H. Nishiyama, M. Shigeta

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.

Original languageEnglish
Pages (from-to)125-133
Number of pages9
JournalEPJ Applied Physics
Volume18
Issue number2
DOIs
Publication statusPublished - 2002 May

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics

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