Novel Submicrometer MOS Devices by Self-Aligned Nitridation of Silicide

Hiroko Kaneko, Shinji Shimizu, Mitsumasa Koyanagi, Yukiko Kubota, Seigô Kishino

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

A new MOS technology is developed for submicrometer MOS devices. In this new technology, TiSi2 is formed on the source and drain diffused layers by self-aligned silicidation to reduce the sheet resistance, and TiN is formed in the contact holes by self-aligned nitridation of TiSi2. This TiN can be used as an effective barrier metal between Al and Si. TiSi2 is prepared by a two-step annealing method to prevent a reaction between Ti and the field oxide. PSG cap annealing after TiSi2 formation provides excellent p-n junction characteristics and relatively low silicide sheet resistance of 4 Ω/□ even after annealing at 950°C for 30 min. TiN is formed by direct thermal nitridation of TiSi2 in N2 ambient at a temperature higher than 900°C after contact hole formation. The formation of TiN is confirmed by AES, ESCA, and X-ray diffraction analysis. The TiN formed by direct thermal nitridation is found to prevent Al diffusion into the Si substrate even for post-metallization annealing at 500°C for 1 h. The characteristics of devices fabricated by this new technology also are determined.

Original languageEnglish
Pages (from-to)1702-1709
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume33
Issue number11
DOIs
Publication statusPublished - 1986 Nov

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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