Novel stacked nanodisk with quantum effect fabricated by defect-free chlorine neutral beam etching

Chi Hsien Huang, Makoto Igarashi, Kensuke Nishioka, Masaki Takeguchi, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita, Seiji Samukawa

Research output: Contribution to journalArticle

Abstract

A stacked nanodisk with two nanodisks connected In series by coupling three tunnel junctions was successfully fabricated by using a bionano-process that comprises NF3 treatment and defect-free neutral beam (NB) etching as etchers and a 7-nm-diameter ferritin iron-oxide core as a mask. Precise control of the etching process to etch such an alternative structure was achieved by combining NF3 treatment and three-step NB etching with X-ray photoelectron spectroscopy (XPS) analysis. The transmission electron microscope (TEM) image clearly revealed an alternative structure for nanodisks and tunnel junctions in series. A Coulomb staircase was observed using conductive atomic force microscope (AFM) at room temperature. The results suggest that stacked nanodisks with the quantum effect could be promising candidates for quantum effect devices.

Original languageEnglish
Pages (from-to)840021-840023
Number of pages3
JournalApplied Physics Express
Volume1
Issue number8
DOIs
Publication statusPublished - 2008 Aug 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Huang, C. H., Igarashi, M., Nishioka, K., Takeguchi, M., Uraoka, Y., Fuyuki, T., Yamashita, I., & Samukawa, S. (2008). Novel stacked nanodisk with quantum effect fabricated by defect-free chlorine neutral beam etching. Applied Physics Express, 1(8), 840021-840023. https://doi.org/10.1143/APEX.1.084002