TY - GEN
T1 - Novel neutral beam etching processes for future nanoscale devices
AU - Samukawa, Seiji
PY - 2007/12/1
Y1 - 2007/12/1
UR - http://www.scopus.com/inward/record.url?scp=47349117782&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=47349117782&partnerID=8YFLogxK
U2 - 10.1109/IMNC.2007.4456309
DO - 10.1109/IMNC.2007.4456309
M3 - Conference contribution
AN - SCOPUS:47349117782
SN - 4990247248
SN - 9784990247249
T3 - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
SP - 472
EP - 473
BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
T2 - s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Y2 - 5 November 2007 through 8 November 2007
ER -