@inbook{52fa697a434a4a51bc54c0b9e4c95091,
title = "Novel fabrication method of Si nanostructures using atomic force microscope (AFM) field-enhanced oxidation and anisotropic wet chemical etching",
abstract = "We have demonstrated a novel method of fabricating Si nanostructures. Based on a combination of atomic force microscope (AFM) field-enhanced oxidation and anisotropic wet chemical etching, Si nanostructures with a minimum width of 50 nm are successfully obtained within the intended area with precise alignment. Overlay patterning followed by AFM field-enhanced oxidation is carried out with high accuracy. It is confirmed that the field-enhanced oxide line with a thickness of at least about 3 nm can act as an mask against anisotropic wet chemical etching. This method enables the realization of sub-10 nm Si nanostructures.",
author = "Kiyoshi Araki and Kiyoshi Morimoto and Kiyoyuki Morita and Masaaki Niwa and Yoshihiko Hirai",
year = "1996",
month = dec,
language = "English",
series = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers",
number = "12 B",
pages = "6347--6695",
editor = "Y. Aoyagi and N. Atoda and T. Fukui and M. Komuro and M. Kotera and {et al}, al",
booktitle = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers",
edition = "12 B",
note = "Proceedings of the 1996 9th International MicroProcess Conference, MPC'96 ; Conference date: 08-07-1996 Through 11-07-1996",
}