Novel doping technology for ultra-shallow junction fabrication: Boron diffusion from boron-adsorbed layer by rapid thermal annealing

Ki Seon Kim, Yun Heub Song, Ki Tae Park, Hiroyuki Kurino, Takashi Matsuura, Kazuhiro Hane, Mitsumasa Koyanagi

Research output: Contribution to journalConference articlepeer-review

15 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Novel doping technology for ultra-shallow junction fabrication: Boron diffusion from boron-adsorbed layer by rapid thermal annealing'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy