Novel denture-cleaning system based on hydroxyl radical disinfection

Taro Kanno, Keisuke Nakamura, Hiroyo Ikai, Eisei Hayashi, Midori Shirato, Takayuki Mokudai, Atsuo Iwasawa, Yoshimi Niwano, Masahiro Kohno, Keiichi Sasaki

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H2O2). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H2O2 and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H2O2; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H2O2. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.

Original languageEnglish
Pages (from-to)376-380
Number of pages5
JournalInternational Journal of Prosthodontics
Volume25
Issue number4
Publication statusPublished - 2012 Jan 1

ASJC Scopus subject areas

  • Oral Surgery

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