Novel ArF photoresist polymer to suppress the roughness formation in plasma etching processes

Keisuke Kato, Atsushi Yasuda, Shin Ichi Maeda, Takuji Uesugi, Takeru Okada, Akira Wada, Seiji Samukawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint Dive into the research topics of 'Novel ArF photoresist polymer to suppress the roughness formation in plasma etching processes'. Together they form a unique fingerprint.

Mathematics

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy