Normal Incidence Reflectometry of Concave Multilayer Mirrors Using Synchrotron Radiation to Evaluate the Period Thickness Distribution

Tadashi Hatano, Shogo Kubota, Yasunobu Adachi, Toshihide Tsuru, Masaki Yamamoto

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Citations (Scopus)

    Abstract

    For the purpose of fabricating curved multilayer mirrors, we developed an ion beam sputtering deposition system with a programmable shutter for thickness distribution control. In this report we fabricated a Mo/Si multilayer concave mirror of a 100 mm diameter and a 300 mm radius of curvature to be used at 13.5 nm at an angle of incidence of 5°. At first a test multilayer was deposited without thickness distribution control and the lateral distribution of deposition rate was evaluated. We used the normal incidence EUV reflectometry to determine the multilayer period thickness while we usually use the small angle X-ray diffractometry when the substrate is plane. The measurements were performed at BL-12A of the Photon Factory, KEK. In an analysis of a spectral reflectance, the side band structure as well as the main peak was taken into account. The natural thickness at the outermost part was found to be 13% thinner than that at the center. Next a Mo/Si multilayer of uniform thickness over the substrate was deposited with the shutter programmed to compensate for the unevenness of deposition rate. By the normal incidence EUV reflectometry the thickness distribution was found to be successfully uniform within an error of P-V 0.3%.

    Original languageEnglish
    Title of host publicationSynchrotron Radiation Instrumentation
    Subtitle of host publication8th International Conference on Synchrotron Radiation Instrumentation
    PublisherAmerican Institute of Physics Inc.
    Pages839-842
    Number of pages4
    ISBN (Electronic)0735401799
    DOIs
    Publication statusPublished - 2004 May 12
    Event8th International Conference on Synchrotron Radiation Instrumentation - San Francisco, United States
    Duration: 2003 Aug 252003 Aug 29

    Publication series

    NameAIP Conference Proceedings
    Volume705
    ISSN (Print)0094-243X
    ISSN (Electronic)1551-7616

    Other

    Other8th International Conference on Synchrotron Radiation Instrumentation
    Country/TerritoryUnited States
    CitySan Francisco
    Period03/8/2503/8/29

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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