Nonlinear optical polymer patterned by nanoimprint lithography as a photonic crystal waveguide structure

Motoki Okinaka; Shin Ichiro Inoue; Kazuhito Tsukagoshi; Yoshinobu Aoyagi

doi:10.1116/1.2151911

Nonlinear optical polymer patterned by nanoimprint lithography as a photonic crystal waveguide structure

Motoki Okinaka, Shin Ichiro Inoue, Kazuhito Tsukagoshi, Yoshinobu Aoyagi

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

A photonic crystal (PC) waveguide structure has been imprinted onto a nonlinear optical (NLO) polymer using thermal nanoimprint lithography (NIL). The imprint characteristics of Disperse Red 1 doped poly(methylmethacrylate) as the NLO polymer are evaluated by atomic force microscope. A waveguide structure with a uniform height of 650 nm is obtained at an imprint temperature of 120 °C. A peeling problem at the interfaces between constructing layers is solved by preparation of an appropriate substrate structure. Finally, polarized reflectivity measurement was performed for the imprinted PC waveguide structure. Several sharp dips corresponding to the formation of photonic band dispersion are observed. It was demonstrated that NIL is a direct path to the precise patterning of PC waveguide structures.

Original language	English
Pages (from-to)	271-273
Number of pages	3
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	24
Issue number	1
DOIs	https://doi.org/10.1116/1.2151911
Publication status	Published - 2006 Jan 1
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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Okinaka, M., Inoue, S. I., Tsukagoshi, K., & Aoyagi, Y. (2006). Nonlinear optical polymer patterned by nanoimprint lithography as a photonic crystal waveguide structure. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 24(1), 271-273. https://doi.org/10.1116/1.2151911

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abstract = "A photonic crystal (PC) waveguide structure has been imprinted onto a nonlinear optical (NLO) polymer using thermal nanoimprint lithography (NIL). The imprint characteristics of Disperse Red 1 doped poly(methylmethacrylate) as the NLO polymer are evaluated by atomic force microscope. A waveguide structure with a uniform height of 650 nm is obtained at an imprint temperature of 120 °C. A peeling problem at the interfaces between constructing layers is solved by preparation of an appropriate substrate structure. Finally, polarized reflectivity measurement was performed for the imprinted PC waveguide structure. Several sharp dips corresponding to the formation of photonic band dispersion are observed. It was demonstrated that NIL is a direct path to the precise patterning of PC waveguide structures.",

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