Nonlinear optical polymer patterned by nanoimprint lithography as a photonic crystal waveguide structure

Motoki Okinaka, Shin Ichiro Inoue, Kazuhito Tsukagoshi, Yoshinobu Aoyagi

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A photonic crystal (PC) waveguide structure has been imprinted onto a nonlinear optical (NLO) polymer using thermal nanoimprint lithography (NIL). The imprint characteristics of Disperse Red 1 doped poly(methylmethacrylate) as the NLO polymer are evaluated by atomic force microscope. A waveguide structure with a uniform height of 650 nm is obtained at an imprint temperature of 120 °C. A peeling problem at the interfaces between constructing layers is solved by preparation of an appropriate substrate structure. Finally, polarized reflectivity measurement was performed for the imprinted PC waveguide structure. Several sharp dips corresponding to the formation of photonic band dispersion are observed. It was demonstrated that NIL is a direct path to the precise patterning of PC waveguide structures.

Original languageEnglish
Pages (from-to)271-273
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24
Issue number1
DOIs
Publication statusPublished - 2006 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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