Abstract
Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.
Original language | English |
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Pages (from-to) | 197-200 |
Number of pages | 4 |
Journal | Journal of Alloys and Compounds |
Volume | 190 |
Issue number | 2 |
DOIs | |
Publication status | Published - 1993 Jan 11 |
ASJC Scopus subject areas
- Mechanics of Materials
- Mechanical Engineering
- Metals and Alloys
- Materials Chemistry