Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

Chorn Cherng Jiang; Takashi Goto; Toshio Hirai

doi:10.1016/0925-8388(93)90399-8

Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

Chorn Cherng Jiang, Takashi Goto, Toshio Hirai

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

Abstract

Wide-ranging non-stoichiometric titanium nitride (TiN_x) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl₄-NH₃-H₂ system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 10³ kg m^-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiN_x were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiN_x plates was discussed by comparing the calculations with experimental results.

Original language	English
Pages (from-to)	197-200
Number of pages	4
Journal	Journal of Alloys and Compounds
Volume	190
Issue number	2
DOIs	https://doi.org/10.1016/0925-8388(93)90399-8
Publication status	Published - 1993 Jan 11
Externally published	Yes

ASJC Scopus subject areas

Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/0925-8388(93)90399-8

Cite this

@article{683448aa43a049328f54c5b8de5e4448,

title = "Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition",

abstract = "Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.",

author = "Jiang, {Chorn Cherng} and Takashi Goto and Toshio Hirai",

note = "Funding Information: This research was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture under Contracts 02203105 and 63850149.",

year = "1993",

month = jan,

day = "11",

doi = "10.1016/0925-8388(93)90399-8",

language = "English",

volume = "190",

pages = "197--200",

journal = "Journal of Alloys and Compounds",

issn = "0925-8388",

publisher = "Elsevier BV",

number = "2",

}

TY - JOUR

T1 - Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

AU - Jiang, Chorn Cherng

AU - Goto, Takashi

AU - Hirai, Toshio

N1 - Funding Information: This research was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture under Contracts 02203105 and 63850149.

PY - 1993/1/11

Y1 - 1993/1/11

N2 - Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.

AB - Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.

UR - http://www.scopus.com/inward/record.url?scp=0027148187&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0027148187&partnerID=8YFLogxK

U2 - 10.1016/0925-8388(93)90399-8

DO - 10.1016/0925-8388(93)90399-8

M3 - Article

AN - SCOPUS:0027148187

VL - 190

SP - 197

EP - 200

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

SN - 0925-8388

IS - 2

ER -

Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this