Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

Chorn Cherng Jiang, Takashi Goto, Toshio Hirai

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.

Original languageEnglish
Pages (from-to)197-200
Number of pages4
JournalJournal of Alloys and Compounds
Volume190
Issue number2
DOIs
Publication statusPublished - 1993 Jan 11

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition'. Together they form a unique fingerprint.

Cite this