Non-epitaxial and graphoepitaxial growth of tin thin films on an UHV-cleaved sodium chloride substrate

T. Osaka, Y. Kasukabe, H. Nakamura

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Thin films of tin were prepared by vacuum deposition on an UHV-cleaved sodium chloride substrate at room temperature in order to study the growth features. The small particles of tin, which were examined by high resolution TEM and electron diffraction, grew graphoepitaxially on steps, whereas those on flat areas were located and oriented almost randomly. The results, therefore, indicate that several works concerning teh epitaxial growth of tin that has been reported so far have been performed on surfaces with a high density of steps parallel to the 〈100〉 direction of the substrate.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalJournal of Crystal Growth
Volume69
Issue number1
DOIs
Publication statusPublished - 1984 Nov 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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