TY - JOUR
T1 - Noise analysis and design optimization due to pattern processing in perpendicular patterned media
AU - Miura, Kenji
AU - Murakami, Yusuke
AU - Aoi, Hajime
AU - Muraoka, Hiroaki
AU - Nakamura, Yoshihisa
N1 - Funding Information:
This work was partly supported by the IT-program (RR2002) and Research and Development for Next-Generation Information Technology from MEXT, Japanese Government and SRC.
PY - 2008/11
Y1 - 2008/11
N2 - In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.
AB - In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.
KW - Line edge roughness
KW - Lithographical resolution
KW - Patterned media
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U2 - 10.1016/j.jmmm.2008.08.061
DO - 10.1016/j.jmmm.2008.08.061
M3 - Article
AN - SCOPUS:53749091638
VL - 320
SP - 2904
EP - 2907
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
SN - 0304-8853
IS - 22
ER -