Noise analysis and design optimization due to pattern processing in perpendicular patterned media

Kenji Miura; Yusuke Murakami; Hajime Aoi; Hiroaki Muraoka; Yoshihisa Nakamura

doi:10.1016/j.jmmm.2008.08.061

Noise analysis and design optimization due to pattern processing in perpendicular patterned media

Kenji Miura, Yusuke Murakami, Hajime Aoi, Hiroaki Muraoka, Yoshihisa Nakamura

Broadband Engineering Division

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.

Original language	English
Pages (from-to)	2904-2907
Number of pages	4
Journal	Journal of Magnetism and Magnetic Materials
Volume	320
Issue number	22
DOIs	https://doi.org/10.1016/j.jmmm.2008.08.061
Publication status	Published - 2008 Nov

Keywords

Line edge roughness
Lithographical resolution
Patterned media

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/j.jmmm.2008.08.061

Cite this

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title = "Noise analysis and design optimization due to pattern processing in perpendicular patterned media",

abstract = "In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.",

keywords = "Line edge roughness, Lithographical resolution, Patterned media",

author = "Kenji Miura and Yusuke Murakami and Hajime Aoi and Hiroaki Muraoka and Yoshihisa Nakamura",

note = "Funding Information: This work was partly supported by the IT-program (RR2002) and Research and Development for Next-Generation Information Technology from MEXT, Japanese Government and SRC.",

year = "2008",

month = nov,

doi = "10.1016/j.jmmm.2008.08.061",

language = "English",

volume = "320",

pages = "2904--2907",

journal = "Journal of Magnetism and Magnetic Materials",

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TY - JOUR

T1 - Noise analysis and design optimization due to pattern processing in perpendicular patterned media

AU - Miura, Kenji

AU - Murakami, Yusuke

AU - Aoi, Hajime

AU - Muraoka, Hiroaki

AU - Nakamura, Yoshihisa

N1 - Funding Information: This work was partly supported by the IT-program (RR2002) and Research and Development for Next-Generation Information Technology from MEXT, Japanese Government and SRC.

PY - 2008/11

Y1 - 2008/11

N2 - In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.

AB - In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.

KW - Line edge roughness

KW - Lithographical resolution

KW - Patterned media

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M3 - Article

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EP - 2907

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

SN - 0304-8853

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ER -

Noise analysis and design optimization due to pattern processing in perpendicular patterned media

Abstract

Keywords

ASJC Scopus subject areas

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