Nitrogen doping and thermal stability in HfSiO xN y studied by photoemission and x-ray absorption spectroscopy

Satoshi Toyoda, Jun Okabayashi, Haruhiko Takahashi, Masaharu Oshima, Dong Ick Lee, Shiyu Sun, Steven Sun, Piero A. Pianetta, Takashi Ando, Seiichi Fukuda

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Physics & Astronomy