TY - JOUR
T1 - Nitriding of evaporated-ti thin films by ion implantation
AU - Kasukabe, Yoshitaka
AU - Ootubo, Junichi
AU - Nagata, Shinji
AU - Kishimoto, Mokuyoshi
AU - Fujino, Yutaka
AU - Yamaguchi, Adae
AU - Yamada, Yukio
PY - 1995/6
Y1 - 1995/6
N2 - Nitrogen ions (N2+) with 62 keV have been implanted into 100-nm-thick Ti films evaporated on thermally cleaned NaCl substrates. Unimplanted and N-implanted Ti films have been examined by transmission electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The analysis has provided evidence that N-implantation results in the epitaxial formation of NaCl-type TiNy and simultaneously induces the release of H from evaporated-Ti films containing TiHx. The nitriding of evaporated-Ti films is mainly divided into two elemental processes. One is accompanied by the hcp-fcc transformation and the other is not. The formation mechanism for TiNy is discussed.
AB - Nitrogen ions (N2+) with 62 keV have been implanted into 100-nm-thick Ti films evaporated on thermally cleaned NaCl substrates. Unimplanted and N-implanted Ti films have been examined by transmission electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The analysis has provided evidence that N-implantation results in the epitaxial formation of NaCl-type TiNy and simultaneously induces the release of H from evaporated-Ti films containing TiHx. The nitriding of evaporated-Ti films is mainly divided into two elemental processes. One is accompanied by the hcp-fcc transformation and the other is not. The formation mechanism for TiNy is discussed.
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U2 - 10.1143/JJAP.34.3234
DO - 10.1143/JJAP.34.3234
M3 - Article
AN - SCOPUS:0029328159
VL - 34
SP - 3234
EP - 3239
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 6R
ER -