TY - GEN
T1 - New x-ray nanofocusing devices based on total-reflection zone plates
AU - Takano, H.
AU - Tsujia, T.
AU - Kagoshimaa, Y.
PY - 2011
Y1 - 2011
N2 - X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.
AB - X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.
KW - Fresnel zone plate
KW - Nanofocusing
KW - Reflection zone plate
KW - Synchrotron radiation
KW - X-ray focusing device
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U2 - 10.1117/12.892678
DO - 10.1117/12.892678
M3 - Conference contribution
AN - SCOPUS:80054054867
SN - 9780819487490
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in X-Ray/EUV Optics and Components VI
T2 - Advances in X-Ray/EUV Optics and Components VI
Y2 - 22 August 2011 through 24 August 2011
ER -