New three-dimensional high-density stacked-surrounding gate transistor (S-SGT) flash memory architecture using self-aligned interconnection fabrication technology without photolithography process for tera-bits and beyond

Hiroshi Sakuraba, Kazushi Kinoshita, Takuji Tanigami, Takashi Yokoyama, Shinji Horii, Masahiro Saitoh, Keizou Sakiyama, Tetsuo Endoh, Fujio Masuoka

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

New three-dimensional Stacked-Surrounding Gate Transistor (S-SGT) flash memory architecture can achieve the cell area of 3.88F2 per bit using the 0.2μm design rule. The new architecture is realized by stacking two select transistors and two memory cells vertically on each pillar located in a two-dimensional array matrix. Each gate and each interconnection of this new architecture are fabricated by the vertical self-alignment process and horizontal self-alignment process simultaneously using HTO conformal deposition and reactive ion etching (RIE) without using the photolithography process. The new three-dimensional S-SGT flash memory architecture is applicable to high-density nonvolatile memories as large as tera-bits and beyond.

Original languageEnglish
Pages (from-to)2217-2219
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number4 B
DOIs
Publication statusPublished - 2004 Apr

Keywords

  • Flash memory
  • Self-aligned interconnection fabrication technology
  • Stacked-surrounding gate transistor (S-SGT) flash memory

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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