New plasma source with an UHF (500 MHz) antenna

Y. Nakagawa, S. Samukawa, H. Ueyama, T. Tsukada, K. Shinohara

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


A high density, low temperature, and uniform plasma was achieved using an UHF plasma source. The UHF power was coupled with a spokewise antenna assembly. The density of the CF4/O2 plasma was larger than 4×1010 cm-3 over a plasma diameter of 300 mm and the electron temperature was around 2.5 eV. The properties of the UHF plasma source are applicable to the future ULSI processing.

Original languageEnglish
Pages (from-to)169-171
Number of pages3
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 1996 Aug 1
Externally publishedYes


  • Fluorine
  • Optical spectroscopy
  • Plasma processing and deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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