TY - JOUR
T1 - New Method of Photopatterning with LB Films Based on a Chemically Amplified Mechanism
AU - Li, Tie Sheng
AU - Masaya, Mitsuishi
AU - Tokuji, Miyashta
N1 - Funding Information:
* Supported by a Grant-in-Aid for Scientific Research from the Japanese Ministry of Education, Sports, and 14205130) , and Natural Science Foundation of Henan Province( No. 061 1020100). * * To whom correspondence should be addressed. Email: lts34@ zzu. edu. cn; miya@ mail. tagen. ac. jp
PY - 2006/7
Y1 - 2006/7
N2 - A new approach to introducing a photoacid generator( PAG) into Langmuir-Blodgett( LB) films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system used here consists of two components: a copolymer, poly ( dodecrylacrylamide-co-4-t-butyloxylvinyl-phenylcarbonate) [P(DDA-t-BVPC53)] and a PAG, tri(2,3-dibromopropyl) isocyanurate(TDBPIC). In the two-component system, the acid generated by the PAG catalyzes the deprotection reaction of P(DDA-t-BVPC53), to remove the tert-butoxycarbonyl group(t-BOC) in the exposed region during the postexposure baking process, thus rendering the exposed region soluble to alkaline aqueous solvents to form a positive tone. Photolithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation, followed by development with an alkaline solution. The LB films can be used to generate etched gold relief images on a glass substrate via an aqueous iodide, like ammonium iodide, in alcohol / water as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.
AB - A new approach to introducing a photoacid generator( PAG) into Langmuir-Blodgett( LB) films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system used here consists of two components: a copolymer, poly ( dodecrylacrylamide-co-4-t-butyloxylvinyl-phenylcarbonate) [P(DDA-t-BVPC53)] and a PAG, tri(2,3-dibromopropyl) isocyanurate(TDBPIC). In the two-component system, the acid generated by the PAG catalyzes the deprotection reaction of P(DDA-t-BVPC53), to remove the tert-butoxycarbonyl group(t-BOC) in the exposed region during the postexposure baking process, thus rendering the exposed region soluble to alkaline aqueous solvents to form a positive tone. Photolithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation, followed by development with an alkaline solution. The LB films can be used to generate etched gold relief images on a glass substrate via an aqueous iodide, like ammonium iodide, in alcohol / water as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.
KW - Chemically amplified resist
KW - Copolymer
KW - LB film
KW - Photopatterning
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U2 - 10.1016/S1005-9040(06)60158-X
DO - 10.1016/S1005-9040(06)60158-X
M3 - Article
AN - SCOPUS:33748687809
VL - 22
SP - 543
EP - 546
JO - Chemical Research in Chinese Universities
JF - Chemical Research in Chinese Universities
SN - 1005-9040
IS - 4
ER -