New metalorganic chemical vapor deposition process in a high magnetic field for YBa2Cu3O7

Yanwei Ma, Kazuo Watanabe, Satoshi Awaji, Mitsuhiro Motokawa

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

A hot-wall-type metalorganic chemical vapor deposition (MOCVD) apparatus combined with a cryocooled superconducting magnet was recently developed. This system allows the application of magnetic fields up to 11 T for the MOCVD process. After making various improvements, we succeeded in fabricating YBa2Cu3O7 (YBCO) films under optimal deposition conditions. It is found that the crystallinity of YBCO films produced on polycrystalline silver substrates by the magnetic-field-assisted CVD process is improved as compared with those without the magnetic field.

Original languageEnglish
Pages (from-to)L726-L729
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume39
Issue number7
DOIs
Publication statusPublished - 2000

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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