New metal organic gas supply system by using an advanced flow control system

M. Yamaji, S. Yamashita, A. Hidaka, M. Nagase, N. Ikeda, Shigetoshi Sugawa, T. Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Gas flow control is important factor that influences the concentration of process gas and the pressure of the process chamber. In manufacturing processes that use metal organic (MO) gases, a system that controls the flow rate of MO gas must be developed to improve film performance and the reliability of film formation. We have developed a high temperature flow control system based on pressure measurements (HT-FCS) to control the flow rate of MO gas. Moreover, a liquid source control system that combines a HT-FCS and vaporizer was developed. Using this system, it was possible to control the flow rate of MO gas with high accuracy for extended periods. A flow control system that can supply MO gas with a stable flow rate by vaporizing MO material with the quantity needed at each time has been realized.

Original languageEnglish
Title of host publicationDielectrics for Nanosystems 5
Subtitle of host publicationMaterials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology: More than Moore - Beyond CMOS Emerging Materials and Devices
Pages429-435
Number of pages7
Edition3
DOIs
Publication statusPublished - 2012 Nov 19
Event5th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 221st ECS Meeting - Seattle, WA, United States
Duration: 2012 May 62012 May 10

Publication series

NameECS Transactions
Number3
Volume45
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other5th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 221st ECS Meeting
CountryUnited States
CitySeattle, WA
Period12/5/612/5/10

ASJC Scopus subject areas

  • Engineering(all)

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