New antiferromagnetic RuRhMn film and its application for spin-valves

S. Araki; E. Omata; M. Sano; M. Ohta; K. Noguchi; H. Morita; M. Matsuzaki

doi:10.1109/20.667771

New antiferromagnetic RuRhMn film and its application for spin-valves

S. Araki, E. Omata, M. Sano, M. Ohta, K. Noguchi, H. Morita, M. Matsuzaki

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit ran, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and much better than one of FeMn films.

Original language	English
Pages (from-to)	387-389
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	34
Issue number	2 PART 1
DOIs	https://doi.org/10.1109/20.667771
Publication status	Published - 1998
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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abstract = "We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit ran, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and much better than one of FeMn films.",

author = "S. Araki and E. Omata and M. Sano and M. Ohta and K. Noguchi and H. Morita and M. Matsuzaki",

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T1 - New antiferromagnetic RuRhMn film and its application for spin-valves

AU - Araki, S.

AU - Omata, E.

AU - Sano, M.

AU - Ohta, M.

AU - Noguchi, K.

AU - Morita, H.

AU - Matsuzaki, M.

PY - 1998

Y1 - 1998

N2 - We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit ran, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and much better than one of FeMn films.

AB - We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit ran, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and much better than one of FeMn films.

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New antiferromagnetic RuRhMn film and its application for spin-valves

Abstract

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