New antiferromagnetic RuRhMn film and its application for spin-valves

S. Araki, E. Omata, M. Sano, M. Ohta, K. Noguchi, H. Morita, M. Matsuzaki

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)


We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit ran, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and much better than one of FeMn films.

Original languageEnglish
Pages (from-to)387-389
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number2 PART 1
Publication statusPublished - 1998
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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