Neutral beam technology - Defect-free nanofabrication for novel nanomaterials and nanodevices

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ultra-low-damage nanofabrication techniques using neutral beam technology that taps into the essential nature of nanomaterials and nanostructures are actively developing for innovative nanodevices.

Original languageEnglish
Title of host publication2014 International Symposium on Next-Generation Electronics, ISNE 2014
PublisherIEEE Computer Society
ISBN (Print)9781479947805
DOIs
Publication statusPublished - 2014 Jan 1
Event3rd International Symposium on Next-Generation Electronics, ISNE 2014 - Taoyuan, Taiwan, Province of China
Duration: 2014 May 72014 May 10

Publication series

Name2014 International Symposium on Next-Generation Electronics, ISNE 2014

Other

Other3rd International Symposium on Next-Generation Electronics, ISNE 2014
CountryTaiwan, Province of China
CityTaoyuan
Period14/5/714/5/10

Keywords

  • Defect Control
  • Deposition
  • Etching
  • Nanodevices
  • Neutral Bema Technology
  • Surface Modification

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Neutral beam technology - Defect-free nanofabrication for novel nanomaterials and nanodevices'. Together they form a unique fingerprint.

Cite this