Networked-nanographite wire grown on SiO2 dielectric without catalysts using metal-photoemission-assisted plasma-enhanced CVD

Motonobu Sato, Shuichi Ogawa, Toshiteru Kaga, Haruki Sumi, Eiji Ikenaga, Yuji Takakuwa, Mizuhisa Nihei, Naoki Yokoyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have developed networked-nanographite (NNG) wires as the first step for multilayer graphene interconnects. Photoemission-assisted Plasma-enhanced CVD has been proposed as a growth method on dielectrics without catalysts. The activation energy of carrier conduction for NNG wire was almost the same as that of multilayer graphene exfoliated from highly oriented pyrolytic graphite (HOPG). This means that NNG consists of domains of multilayer graphene. Although we need to improve growth conditions, NNG is one of the candidates for future interconnect materials.

Original languageEnglish
Title of host publication2010 IEEE International Interconnect Technology Conference, IITC 2010
DOIs
Publication statusPublished - 2010 Aug 20
Event2010 IEEE International Interconnect Technology Conference, IITC 2010 - Burlingame, CA, United States
Duration: 2010 Jun 62010 Jun 9

Publication series

Name2010 IEEE International Interconnect Technology Conference, IITC 2010

Other

Other2010 IEEE International Interconnect Technology Conference, IITC 2010
CountryUnited States
CityBurlingame, CA
Period10/6/610/6/9

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Hardware and Architecture

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