Narrow stripe fabrication of soft magnetic materials by trench filling process

H. Yoda; A. Hori; N. Inoue; Masashi Sahashi; A. Sawabe

doi:10.1109/20.490086

Narrow stripe fabrication of soft magnetic materials by trench filling process

H. Yoda, A. Hori, N. Inoue, Masashi Sahashi, A. Sawabe

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Low-pressure collimation sputtering was applied to trench filling with soft magnetic materials. Collimation and substrate bias were found effective to fill the trenches with a uniform film. NiFe and CoZrNb were tested as soft magnetic materials, and it was found that NiFe was suitable for the process. Stripes of NiFe about two micron wide and one micron high, and with excellent morphology, were fabricated inside trenches by combining collimation sputtering with an etch-back process.

Original language	English
Pages (from-to)	2666-2668
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	31
Issue number	6
DOIs	https://doi.org/10.1109/20.490086
Publication status	Published - 1995 Jan 1
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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abstract = "Low-pressure collimation sputtering was applied to trench filling with soft magnetic materials. Collimation and substrate bias were found effective to fill the trenches with a uniform film. NiFe and CoZrNb were tested as soft magnetic materials, and it was found that NiFe was suitable for the process. Stripes of NiFe about two micron wide and one micron high, and with excellent morphology, were fabricated inside trenches by combining collimation sputtering with an etch-back process.",

author = "H. Yoda and A. Hori and N. Inoue and Masashi Sahashi and A. Sawabe",

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AU - Hori, A.

AU - Inoue, N.

AU - Sahashi, Masashi

AU - Sawabe, A.

PY - 1995/1/1

Y1 - 1995/1/1

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AB - Low-pressure collimation sputtering was applied to trench filling with soft magnetic materials. Collimation and substrate bias were found effective to fill the trenches with a uniform film. NiFe and CoZrNb were tested as soft magnetic materials, and it was found that NiFe was suitable for the process. Stripes of NiFe about two micron wide and one micron high, and with excellent morphology, were fabricated inside trenches by combining collimation sputtering with an etch-back process.

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Narrow stripe fabrication of soft magnetic materials by trench filling process

Abstract

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