Nanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering

Parmanand Sharma, Wei Zhang, Kenji Amiya, Hisamichi Kimura, Akihisa Inoue

Research output: Contribution to journalArticlepeer-review

59 Citations (Scopus)

Abstract

Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region (ΔT X = 95 K), very smooth surface (R a = 0.65 nm), and an extremely high value of Vicker's hardness (H v = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.

Original languageEnglish
Pages (from-to)416-420
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume5
Issue number3
DOIs
Publication statusPublished - 2005 Dec 1
Externally publishedYes

Keywords

  • Atomic force microscopy
  • Focused ion beam etching
  • Metallic glass thin films
  • Nanomolds
  • Nanopatterning
  • Sputtering
  • Zr-Al-Cu-Ni

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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