Abstract
Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region (ΔT X = 95 K), very smooth surface (R a = 0.65 nm), and an extremely high value of Vicker's hardness (H v = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.
| Original language | English |
|---|---|
| Pages (from-to) | 416-420 |
| Number of pages | 5 |
| Journal | Journal of Nanoscience and Nanotechnology |
| Volume | 5 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2005 Dec 1 |
| Externally published | Yes |
Keywords
- Atomic force microscopy
- Focused ion beam etching
- Metallic glass thin films
- Nanomolds
- Nanopatterning
- Sputtering
- Zr-Al-Cu-Ni
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Biomedical Engineering
- Materials Science(all)
- Condensed Matter Physics