Nanoscale lithography with frequency-modulation atomic force microscopy

Masayuki Hamada, T. Eguchi, K. Akiyama, Y. Hasegawa

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


A lithographic method to draw nanoscale structures by repetitive depositions of the tip material by field evaporation has been developed based on frequency-modulation atomic force microscopy (FM-AFM). Because of high stiffness of quartz tuning forks, a force sensor in the AFM, unwanted mechanical contact of the AFM tip with the substrate was prevented. Precise control of the tip-substrate gap distance with FM-AFM and a gold tip sharpened with focused ion beam enable us to deposit gold dots as small as ∼20 nm in size and construct nanoscale patterns.

Original languageEnglish
Article number123706
JournalReview of Scientific Instruments
Issue number12
Publication statusPublished - 2008

ASJC Scopus subject areas

  • Instrumentation


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