Nanoprocessing of free-standing thin films by ultrafast laser ablation

Yuuki Uesugi, Yuichi Kozawa, Shunichi Sato

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, we demonstrated the processing of free-standing thin films by the ultrafast laser ablation, which has been difficult to process using existing nanoprocessing methods such as focused ion beam milling. First, we fabricated a holographic diffraction grating for transmission electron microscopy using a two-beam interference laser processing. We fabricated an electron phase hologram made of silicon with a thickness of 35 nm that generated electron vortex beams with high efficiency. Then, we demonstrated the laser processing of silicon nitride membranes with a thickness of 10 nm at near-threshold conditions and realized gratings with sub-100-nm structure. We believe that this technique will introduce a new nanoengineering technology using light because of its suitability for nanofilm processing and ease of use.

Original languageEnglish
Title of host publicationLaser-Based Micro- and Nanoprocessing XV
EditorsUdo Klotzbach, Akira Watanabe, Rainer Kling
PublisherSPIE
ISBN (Electronic)9781510641839
DOIs
Publication statusPublished - 2021
EventLaser-Based Micro- and Nanoprocessing XV 2021 - Virtual, Online, United States
Duration: 2021 Mar 62021 Mar 11

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11674
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceLaser-Based Micro- and Nanoprocessing XV 2021
Country/TerritoryUnited States
CityVirtual, Online
Period21/3/621/3/11

Keywords

  • Electron hologram
  • Interference processing
  • Laser ablation
  • Membrane

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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