Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Takeo Miyake, Takashi Tanii, Koichi Kato, Takumi Hosaka, Yuzo Kanari, Hironori Sonobe, Iwao Ohdomari

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

    Original languageEnglish
    Pages (from-to)361-364
    Number of pages4
    JournalChemical Physics Letters
    Volume426
    Issue number4-6
    DOIs
    Publication statusPublished - 2006 Aug 4

    ASJC Scopus subject areas

    • Physics and Astronomy(all)
    • Physical and Theoretical Chemistry

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