Nanofabrication of magnetic tunnel junctions by using electron beam lithography

T. Niizeki, H. Kubota, Y. Ando, T. Miyazaki

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Nanometer-sized ferromagnetic tunnel junctions (MTJs) are suitable to investigate the enhancement of tunnel magnetoresistive effect (TMR) by Coulomb blockade effect. A new fabrication process that enables us to shrink the size of MTJs down to the order of 10nm has been developed. MTJs structured by using this process exhibited large TMR ratio of 38%.

Original languageEnglish
Pages (from-to)1947-1948
Number of pages2
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberIII
DOIs
Publication statusPublished - 2004 May

Keywords

  • Ferromagnetic tunnel junction
  • Single-electron tunneling
  • Tunnel magnetoresistance

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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