Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties

N. I. Fainer, M. L. Kosinova, Yu M. Rumyantsev, E. A. Maximovskii, B. M. Ayupov, B. A. Kolesov, F. A. Kuznetsov, V. G. Kesler, Masami Terauchi, K. Shibata, F. Satoh, Z. X. Cao

    Research output: Contribution to conferencePaperpeer-review

    6 Citations (Scopus)

    Abstract

    Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiCxN y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.

    Original languageEnglish
    Pages1074-1081
    Number of pages8
    Publication statusPublished - 2005 Dec 1
    Event15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
    Duration: 2005 Sep 52005 Sep 9

    Other

    Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
    Country/TerritoryGermany
    CityBochum
    Period05/9/505/9/9

    ASJC Scopus subject areas

    • Engineering(all)

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