Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

Shigeharu Tamura, Masato Yasumoto, Toshiyuki Mihara, Nagao Kamijo, Yoshio Suzuki, Mitsuhiro Awaji, Akihisa Takeuchi, Hidekazu Takano, Katsumi Handa

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.

Original languageEnglish
Pages (from-to)495-499
Number of pages5
Issue number3-4
Publication statusPublished - 2002 Aug 19
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films


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