Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

Shigeharu Tamura, Masato Yasumoto, Toshiyuki Mihara, Nagao Kamijo, Yoshio Suzuki, Mitsuhiro Awaji, Akihisa Takeuchi, Hidekazu Takano, Katsumi Handa

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.

Original languageEnglish
Pages (from-to)495-499
Number of pages5
JournalVacuum
Volume66
Issue number3-4
DOIs
Publication statusPublished - 2002 Aug 19
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition'. Together they form a unique fingerprint.

  • Cite this

    Tamura, S., Yasumoto, M., Mihara, T., Kamijo, N., Suzuki, Y., Awaji, M., Takeuchi, A., Takano, H., & Handa, K. (2002). Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition. Vacuum, 66(3-4), 495-499. https://doi.org/10.1016/S0042-207X(02)00121-5