Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

Shigeharu Tamura; Masato Yasumoto; Toshiyuki Mihara; Nagao Kamijo; Yoshio Suzuki; Mitsuhiro Awaji; Akihisa Takeuchi; Hidekazu Takano; Katsumi Handa

doi:10.1016/S0042-207X(02)00121-5

Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

Shigeharu Tamura, Masato Yasumoto, Toshiyuki Mihara, Nagao Kamijo, Yoshio Suzuki, Mitsuhiro Awaji, Akihisa Takeuchi, Hidekazu Takano, Katsumi Handa

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.

Original language	English
Pages (from-to)	495-499
Number of pages	5
Journal	Vacuum
Volume	66
Issue number	3-4
DOIs	https://doi.org/10.1016/S0042-207X(02)00121-5
Publication status	Published - 2002 Aug 19
Externally published	Yes

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/S0042-207X(02)00121-5

Cite this

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title = "Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition",

abstract = "A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.",

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T1 - Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

AU - Tamura, Shigeharu

AU - Yasumoto, Masato

AU - Mihara, Toshiyuki

AU - Kamijo, Nagao

AU - Suzuki, Yoshio

AU - Awaji, Mitsuhiro

AU - Takeuchi, Akihisa

AU - Takano, Hidekazu

AU - Handa, Katsumi

PY - 2002/8/19

Y1 - 2002/8/19

N2 - A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.

AB - A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability.

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SN - 0042-207X

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ER -

Multilayer fresnel zone plate for high-energy x-ray by dc sputtering deposition

Abstract

ASJC Scopus subject areas

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