Morphology study of oriented SmBCO film deposited by MOCVD

Ting Wang, Rong Tu, Wang Ke, Song Zhang, Lianmeng Zhang, Takashi Goto

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

c-axis-oriented SmBa2Cu3O7 (SmBCO) films have been deposited on (100)- LaAlO3 (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (Tdep) and total pressure (Ptot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of Tdep from 900 to 1 100 °C. At Tdep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At Ptot= 400-800 Pa and Tdep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The Rdep of SmBCO films increased firstly and then decreased with increasing Ptot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at Ptot = 600 Pa, and the corresponding Rdep was 7.2 μm·h-1.

Original languageEnglish
Pages (from-to)15-19
Number of pages5
JournalJournal Wuhan University of Technology, Materials Science Edition
Volume31
Issue number1
DOIs
Publication statusPublished - 2016 Feb 1

Keywords

  • MOCVD
  • SmBCO film
  • morphology
  • orientation

ASJC Scopus subject areas

  • Materials Science(all)

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