Morphology study of oriented SmBCO film deposited by MOCVD

Ting Wang; Rong Tu; Wang Ke; Song Zhang; Lianmeng Zhang; Takashi Goto

doi:10.1007/s11595-016-1322-y

Morphology study of oriented SmBCO film deposited by MOCVD

Ting Wang, Rong Tu, Wang Ke, Song Zhang, Lianmeng Zhang, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

c-axis-oriented SmBa₂Cu₃O₇ (SmBCO) films have been deposited on (100)- LaAlO₃ (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (T_dep) and total pressure (P_tot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of T_dep from 900 to 1 100 °C. At T_dep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At P_tot= 400-800 Pa and T_dep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The R_dep of SmBCO films increased firstly and then decreased with increasing P_tot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at P_tot = 600 Pa, and the corresponding R_dep was 7.2 μm·h^-1.

Original language	English
Pages (from-to)	15-19
Number of pages	5
Journal	Journal Wuhan University of Technology, Materials Science Edition
Volume	31
Issue number	1
DOIs	https://doi.org/10.1007/s11595-016-1322-y
Publication status	Published - 2016 Feb 1

Keywords

MOCVD
SmBCO film
morphology
orientation

ASJC Scopus subject areas

Materials Science(all)

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10.1007/s11595-016-1322-y

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title = "Morphology study of oriented SmBCO film deposited by MOCVD",

abstract = "c-axis-oriented SmBa2Cu3O7 (SmBCO) films have been deposited on (100)- LaAlO3 (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (Tdep) and total pressure (Ptot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of Tdep from 900 to 1 100 °C. At Tdep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At Ptot= 400-800 Pa and Tdep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The Rdep of SmBCO films increased firstly and then decreased with increasing Ptot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at Ptot = 600 Pa, and the corresponding Rdep was 7.2 μm·h-1.",

keywords = "MOCVD, SmBCO film, morphology, orientation",

author = "Ting Wang and Rong Tu and Wang Ke and Song Zhang and Lianmeng Zhang and Takashi Goto",

note = "Funding Information: Funded by National Natural Science Foundation of China (Nos.51102101, 51272196, 51372188, 51521001) and the 111 Project (No.B13035), International Science & Technology Cooperation Program of China (No.2014DFA53090), the Natural Science Foundation of Hubei Province, China (No.2014CFB870), and the Fundamental Research Funds for the Central Universities, China (No.WUT: 2015III023) Publisher Copyright: {\textcopyright} 2016, Wuhan University of Technology and Springer-Verlag Berlin Heidelberg.",

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doi = "10.1007/s11595-016-1322-y",

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T1 - Morphology study of oriented SmBCO film deposited by MOCVD

AU - Wang, Ting

AU - Tu, Rong

AU - Ke, Wang

AU - Zhang, Song

AU - Zhang, Lianmeng

AU - Goto, Takashi

N1 - Funding Information: Funded by National Natural Science Foundation of China (Nos.51102101, 51272196, 51372188, 51521001) and the 111 Project (No.B13035), International Science & Technology Cooperation Program of China (No.2014DFA53090), the Natural Science Foundation of Hubei Province, China (No.2014CFB870), and the Fundamental Research Funds for the Central Universities, China (No.WUT: 2015III023) Publisher Copyright: © 2016, Wuhan University of Technology and Springer-Verlag Berlin Heidelberg.

PY - 2016/2/1

Y1 - 2016/2/1

N2 - c-axis-oriented SmBa2Cu3O7 (SmBCO) films have been deposited on (100)- LaAlO3 (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (Tdep) and total pressure (Ptot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of Tdep from 900 to 1 100 °C. At Tdep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At Ptot= 400-800 Pa and Tdep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The Rdep of SmBCO films increased firstly and then decreased with increasing Ptot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at Ptot = 600 Pa, and the corresponding Rdep was 7.2 μm·h-1.

AB - c-axis-oriented SmBa2Cu3O7 (SmBCO) films have been deposited on (100)- LaAlO3 (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (Tdep) and total pressure (Ptot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of Tdep from 900 to 1 100 °C. At Tdep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At Ptot= 400-800 Pa and Tdep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The Rdep of SmBCO films increased firstly and then decreased with increasing Ptot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at Ptot = 600 Pa, and the corresponding Rdep was 7.2 μm·h-1.

KW - MOCVD

KW - SmBCO film

KW - morphology

KW - orientation

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ER -

Morphology study of oriented SmBCO film deposited by MOCVD

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