Morphology and texture of chemical-vapour-deposited TiN films

Noboru Yoshikawa, Shoji Taniguchi, Atsushi Kikuchi

Research output: Contribution to journalConference article

Abstract

TiN films were obtained by Chemical Vapour Deposition (CVD) under different deposition conditions. Their grain structure, morphology and preferred crystal orientation were investigated. It was observed that well-defined columnar grains developed under conditions of atmospheric thermal CVD, giving rise to strong preferred orientations. In this study, grain structures of CVD-TiN films were classified with respect to the substrate temperature. Films of zone I structure were obtained at 1173 K (0.35 Tm), and those of zone II were obtained at 1223 K (0.38 Tm). Crystal shape of the zone II columnar grains was influenced by the partial pressure of TiCl4 (PTiCl4), and the crystal orientation of films was related to the crystal shapes. Columnar grains increased their thickness during deposition process under conditions of low PTiCl4 and high temperature (>1250 K). The increase rate of grain size had a similar time dependence to that of normal grain growth. The `quadrangular-shaped' and `star-shaped' columnar crystals were formed. They consisted of several crystals and contained twins. Their microstructures were observed in relation to their crystallographic features.

Original languageEnglish
Pages (from-to)221-226
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume472
Publication statusPublished - 1997 Dec 1
EventProceedings of the 1997 MRS Spring Symposium - San Francisco, CA, USA
Duration: 1997 Apr 11997 Apr 4

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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