Morphology and deposition rates of TiB2 prepared by chemical vapour deposition of TiCl4 + B2H6 system

Masakazu Mukaida, Takashi Goto, Toshio Hirai

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10 Citations (Scopus)

Abstract

Titanium diboride (TiB2) is a promising new material in applications to cutting tools, letdown valves for coal conversion reactors and the cathodes of aluminium smelting cells due to its superior wear and corrosion resistance. TiB2 is also a possible first-wall material for a fusion reactor due to its low atomic number (low-z). Titanium diboride (TiB2) deposits were obtained on a graphite substrate by chemical vapour deposition using TiCl4, B2H6 and H2 at deposition temperatures (Tdep) of 1323 to 1773 K and total gas pressures (Ptot) of 4 to 40 kPa. B/Ti molar ratio in the source gases [2B2H6/TiCl4 (mB/Ti)] was varied from 0.6 to 4. TiB2 plates were prepared at mB/Ti = 0.6 to 2. The deposition rate increased with increasing Tdep. The largest value of the deposition rate was 1.4 × 10-7 m sec-1 (0.5 mmh-1) at Tdep = 1773 K, Ptot = 40 kPa and mB/Ti = 0.6. The activation energies for the formation of CVD-TiB2 plate were 41 to 51 kJ mol-1. These values suggest that the diffusion of gaseous species through the boundary layer is a rate-determining process.

Original languageEnglish
Pages (from-to)1069-1075
Number of pages7
JournalJournal of Materials Science
Volume25
Issue number2 A
DOIs
Publication statusPublished - 1990 Jan 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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