Morphological changes in ultraviolet-nanoimprinted resin patterns caused by ultraviolet-curable resins absorbing pentafluoropropane

Shu Kaneko, Kei Kobayashi, Yoshitaka Tsukidate, Hiroshi Hiroshima, Shinji Matsui, Masaru Nakagawa

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

In this article, we revealed the maximum values of pentafluoropropane (PFP) absorbed by acrylate-type monomers and UV-curable resins causing radical photopolymerization and measured the viscosities in a state saturated with PFP. We described the influences of PFP condensable gas effectively used in UV nanoimprinting on the morphologies of resin patterns fabricated by UV nanoimprinting. The weights of the resins and monomers were increased by exposure to a PFP atmosphere, while the viscosities were reduced markedly. The absorption of PFP depended on the chemical structures of the monomers. The solubility parameter calculated by the Hoy method clearly suggested that the monomer with a solubility parameter of 20 (Jcm -3) 1/2 absorbed the most PFP. The UV-curable resin composed of the monomer absorbing a large amount of PFP resulted in morphological changes in nanoimprinted resin patterns where the height was lowered and the outermost surface became rough. The UV-curable resins having hydroxyl groups play an important role in preserving the size fidelity of UV-nanoimprinted resin patterns.

Original languageEnglish
Article number06FJ05
JournalJapanese journal of applied physics
Volume51
Issue number6 PART 2
DOIs
Publication statusPublished - 2012 Jun 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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