Morphologic and crystallographic studies on electrochemically formed chromium nitride films

Koji Amezawa, Takuya Goto, Hiroyuki Tsujimura, Yoshiharu Uchimoto, Rika Hagiwara, Yoichi Tomii, Yasuhiko Ito

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


Chromium nitride films were prepared by anodically oxidizing nitride ions at 0.4-1.5 V versus Li+/Li on chromium substrates in molten LiCl-KCl-Li3N systems at 723 K. A crystalline Cr2N film was successfully prepared at 0.4-1.4 V, and was thicker at more positive electrolytic potential. At 1.5 V, a Cr-N film could be also obtained, but its growth rate was relatively low. The film prepared at 1.5 V consisted of two distinctive layers. The surface layer was amorphous Cr-N containing crystalline CrN particles, and the inner layer was crystalline CrN. It was considered the existence of the amorphous phase suppressed the film growth.

Original languageEnglish
Pages (from-to)122-126
Number of pages5
JournalElectrochimica Acta
Issue number1
Publication statusPublished - 2007 Nov 20


  • Chromium nitride
  • Electrochemical nitriding
  • Molten salt
  • Morphology
  • Nitride film

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Electrochemistry


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