Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation

Ling Han Li, Akio Higo, Masakazu Sugiyama, Yoshiaki Nakano

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    This paper presents a three-dimensional (3D) tapered spot-size converter connecting to silicon wire waveguide and silicon rib waveguide. The silicon 3D structure was essentially formed by a single-step deep anisotropic dry etching of arrayed submicron-scale line patterns with different pitches, resulting in a tailored depth profile which is controlled by the line pattern through loading effect. Subsequent thermal oxidation and removal of the oxidized portion with wet etching led to a bare 3D silicon structure with smooth surface. The optical mode from a 4.6 m 3.1 m silicon rib waveguide was successfully coupled to a 280 nm 500 nm nanowire waveguide by a silicon 3D tapered spot-size converter, with average coupling loss of 1.52 dB.

    Original languageEnglish
    Article number023002
    JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
    Volume10
    Issue number2
    DOIs
    Publication statusPublished - 2011 Jan 1

    Keywords

    • 3D microstructures
    • low coupling loss
    • nanotuned Bosch process
    • silicon rib waveguide
    • silicon wire waveguide
    • spot-size converter

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics
    • Condensed Matter Physics
    • Mechanical Engineering
    • Electrical and Electronic Engineering

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