MOLYBDENUM FILM FORMATION BY LOW PRESSURE CHEMICAL VAPOR DEPOSITION.

Kazumitsu Yasuda, Junichi Murota

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

A new low pressure chemical vapor deposition apparatus for molybdenum film formation by the hydrogen reduction of molybdenum pentachloride is developed. The apparatus realizes the uniformity of film thickness within plus or minus 5% for 25 wafers per batch and molybdenum film formation without oxidation. It is found that the deposition rate is controlled by surface reaction up to a higher temperature than that under atmospheric pressure and is proportional to the 3/2 power of hydrogen partial pressure in the region of surface reaction.

Original languageEnglish
Pages (from-to)615-617
Number of pages3
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume22
Issue number10
Publication statusPublished - 1983 Jan 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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