Molecular Beam Epitaxy Study of Bi2Sr2CuOx Using NO2 as an Oxidizing Agent

Shunji Watanabe, Maki Kawai, Takashi Hanada

Research output: Contribution to journalArticle

32 Citations (Scopus)

Abstract

Molecular beam epitaxy (MBE) of Bi2Sr2CuOx films has been studied using NO2 as an oxidizing agent. The in situ RHEED and the XPS observations have shown that a two-dimensional layer of the Bi2Sr2CuOx phase is formed on a SrTiO3(100) surface even at 300°C under 2×10-7 Torr of NO2.

Original languageEnglish
Pages (from-to)L1111-L1113
JournalJapanese journal of applied physics
Volume29
Issue number7
DOIs
Publication statusPublished - 1990 Jul
Externally publishedYes

Keywords

  • Bisrcuo
  • Mbe
  • No
  • Srtio(100)

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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