Molecular beam epitaxy of Bi 2 Sr 2 CuO x and Bi 2 Sr 2 Ca 0.85 Sr 0.15 Cu 2 O x ultra thin films at 300°C

Maki Kawai, Shunji Watanabe, Takashi Hanada

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55 Citations (Scopus)

Abstract

Molecular beam epitaxy of ultra thin films of Bi 2 Sr 2 CuO 6 (2201 phase) and Bi 2 Sr 2 (Ca 0.85 Sr 0.15 )Cu 2 O 8 (2212 phase) i s realized on SrTiO 3 (100) at a substrate temperature of 300°C, using 10 -5 Pa of NO 2 as an oxidant. The structure of the ultra thin film formed is confirmed by X-ray diffraction. An in-situ RHEED (reflection high energy electron diffraction) study reveals that the film formed has the same in-plane lattice constant as that of the SrTiO 3 (100) substrate, namely the a and b axes are 0.39 nm. Because the a and b axes are lengthened approximately 3%, the c axis of the ultra thin 2201 film was 2.41 nm, shorter than the value for the bulk material. The crystallinity of the film strongly depended on the sequence of the oxidation process, revealing that the elementary unit of the epitaxial growth is the sub-unit of the perovskite structure. In the Bi cuprate series, Sr-Cu-Sr is the elementary unit. As a result, the sequential supply of Bi, Sr, Cu and the oxidant NO 2 is necessary to realize low temperature epitaxy.

Original languageEnglish
Pages (from-to)745-752
Number of pages8
JournalJournal of Crystal Growth
Volume112
Issue number4
DOIs
Publication statusPublished - 1991 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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