Moderate temperature and high-speed synthesis of α-Al2O3 films by laser chemical vapor deposition using Nd:YAG laser

Hokuto Kadokura, Akihiko Ito, Teiichi Kimura, Takashi Goto

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

Al2O3 films were prepared at deposition temperatures (Tdep) from 980 to 1230 K by laser chemical vapor deposition (LCVD) using the continuous wave of a Nd:YAG laser with laser power (PL) up to 260 W. γ-Al2O3 films were obtained at Tdep < 1100 K, whereas α-Al2O3 films were obtained at Tdep > 1100 K. γ-Al2O3 films were morphologically characterized by a cone-like structure, while α-Al2O3 films had hexagonal faceted grains. The highest deposition rate (Rdep) of γ-Al2O3 film was 570 μm h- 1, while that of α-Al2O3 film was 250 μm h- 1. α-Al2O3 films in a single phase were obtained at 170 K lower in Tdep and 100 times higher in Rdep than those by conventional thermal CVD.

Original languageEnglish
Pages (from-to)2302-2306
Number of pages5
JournalSurface and Coatings Technology
Volume204
Issue number14
DOIs
Publication statusPublished - 2010 Apr 15

Keywords

  • Alumina
  • Coating
  • Laser CVD
  • Microstructure

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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